Recently, Shenzhen Long Jing Optoelectronics Technology Co., Ltd. (abbreviation: Long Jing photoelectric) released diffraction optical waveguide, product model name LCE2104H. This is the beginning of this year launched a viewing angle of 40 degrees waveguide grating waveguide grating sample and declare its first product into the product design iteration and preparation of mass production stage after mass production.
LCE2104H field angle is 28 °, exit pupil distance 20mm, the eye range up to 15mm x 12mm, the lens thickness of only 1.4mm, up to 85% transmittance. Compared to other bulk products optical scheme, thin and flexible cutting process, can form glasses closer in appearance, with a more compact, more light-weight machine.
The full process of the R & D and production of 璟 photoelectric diffraction optical waveguide is independently completed, and the diffraction grating design relies on independent intellectual property rights, using independently developed diffractive waveguide assistance design software, independent innovative micro-grating structure, and architecture design, with the international first-line large factory Comparison, get out of the product design route of 璟 璟 光电. Production, such as spin coating, embossing, curing, cutting, assembling and other processes all in Long Jing photoelectric micro-nano laboratory and Shenzhen-Shantou production base is completed, the basic realization of the production of the production process control, quality controlled, the time period can be control.
Long Jing photo from 2017 began diffractive optical waveguide in the direction of the layout, set up 19 years invested tens of millions of micro-nano optics laboratory to achieve diffraction grating products small series production. At the same time, it is expected this year, located in Shenzhen-Shantou Special Cooperation Area of Long Jing photoelectric production base of optical diffraction new production line will complete construction in the existing small batch production trial production, diffractive optical waveguide production capacity up to grade K per month.
Waveguide diffraction process, the first step required by the process of the semiconductor micro-nano by electron beam on the silicon substrate is exposed and made master ion etching, to achieve the full diffraction waveguide manufacturing production whole process of self-control the whole process , Long Jing photoelectric will further increase investment, purchase of equipment related mastering process, the introduction of more micro-nano-tech talent.
Long Jing photoelectric as one of the few in the industry while focusing on an array of optical waveguides, waveguide diffraction development and production of high-tech optical technology companies in the optical waveguide array direction of the product has achieved remarkable dominance. On the diffractive optical waveguide product direction, either from the R & D, production, processing, or accumulation of talent and training, Long Jing photoelectric diffraction waveguide layout has also made remarkable achievements! On the road of industrialization, it will also establish a dominant position.
1. Long Jing diffraction optical waveguide layout:
a) R & D team and superior technical capabilities:
AR optical theory i. Long Jing photoelectric foundation is strong, with a strong design and reverse optical photons optimal design capacity, with more than ten years of research experience in the field of optics, have contributed in the field of optical design and optical diffraction. Academic research team published journals of well-known optical Optics, SPIE, and other domestic Chinese laser including Nature communication, Optics Letters, Applied optics, Optics Express, Journal. It is Optica, Optics Express, Applied Optics and other periodicals reviewers.
ii. Long Jing Center for European Studies team has 10 years of experience in diffractive optics. The team published in the Journal of physical Chemistry C, Optics Letters, Optics and Lasers in Engineering and other publications and many articles, is Optica, Optics Express journal and other reviewers, participated in two EU research projects.
b) the accumulation of product development diffraction optical waveguide: the optical waveguide diffractive optical laboratory with micro and nano 700 flat, nanoimprint experimental lines, while the planning of production lines for nanoimprinting, the electron beam exposure apparatus and etching apparatus, electron microscopy detecting semiconductor lithography equipment and other equipment designed to get through all aspects of processing and detecting the diffraction grating waveguide production line; team are currently focused on the diffraction optical product design.
c) developed a diffraction optical design software tools: Jing Long photoelectric developed dedicated full electromagnetic vector grating structure analysis software and the diffraction grating waveguide design software, both software applications and is now successfully used to design the depth of the diffraction waveguide module the industrial development.
d) layout of the diffraction optical Patent: Jing Long Optical layout mainly two aspects, one innovative waveguide grating microstructures, commonly used to break conventional waveguide grating microstructure; two waveguide grating innovative architecture, because currently the use of waveguide grating architecture, there are two, represented by Microsoft's one-dimensional raster program, and two-dimensional raster programs to WaveOptics represented, Long Jing photoelectric actively exploring a third unique structure, and actively deployed Inventions patent. This is the whole electromagnetic inverse vector calculating out of a topology optimization, compared to one-dimensional and two-dimensional grating can obtain a better field of view of uniformity and homogeneity Eyebox.
e) research centers and universities overseas cooperation:
i. continue to follow up overseas technical trends, relying Long Jing research center in Europe, to further increase cooperation in the implementation of the European universities, while strengthening the capacity of domestic industry.
ii. After the completion of principle for foreign issues breakthrough products make a similar effect within 12 months, and relying on domestic industrial capacity and customer base, increase the iteration and industrial grating products, win more customers.
iii. for cutting-edge technologies such as ultra-volume holographic surface and so on, continuing to maintain focus and follow-up, and has patents related to the layout, they can be judged industrial point of time, to do the preparatory work related to industrialization.
f) diffractive optical waveguide customer cooperation: diffractive optical waveguide module can be done because the volume is smaller, it will be a wider range of customers, in addition to the traditional B-end industrial applications, security, etc., and also to our domestic consumer electronics industry leader manufacturers to customers on behalf of the C-terminal constant contact diffraction direction is expected in 2021 can achieve a small volume shipments, scenes and find potential customers continue to co-polished product.
2. nanoimprint process description:
The process shown above, can be divided into two phases: Phase Preparation nanoimprint mold work and mass production stage. First, prepared by the above process to the template processing pattern on the silicon wafer to serve as a template, by UV nanoimprint resin was spin-coated on a silicon wafer and a larger print more templates above. Then using an ultraviolet printing structures exposed to the fixing resin. Finally, multiple imprint mold production pattern by repeating the above procedure. In the process of production, using a mold to produce a multi-pattern surface relief grating of the waveguide, and then use the functional coating covers the waveguide, and laser cutting techniques separated, and finally a stack of different waveguide structures prepared to achieve an optical module.
3. The nano-imprint apparatus:
The first stage of the plant comprises a nanoimprint apparatus with high accuracy ultraviolet nanoimprint apparatus, spin coating + hot plate apparatus, cleaning and related equipment. UV nanoimprint apparatus with high accuracy mainly for large-volume embossing diffractive optical device, is suitable for bulk production of relief embossing waveguide gratings, holographic elements or the like. Imprintable precision structure, high aspect ratio structures, and the oblique grating structure, can be fully automated nanoimprint according to the recipe. Optional equipment purchased thermal curing and UV-cured in two ways, for different glue process, having versatility. Meanwhile, the device supports the work automatically copied flexible composite mold, the mold having a high precision work, long life, a large area can be significantly reduced in cost nanoimprint mold. + Spin coating apparatus is mainly used for hot plate and spin-spin coating the substrate embossed adhesive coated wafer structure replication material for plastic screw spreadability 300mm diameter wafer and baking process. And surface related destructive cleaning apparatus for cleaning a substrate activation. Exploration Jing Long embossing process satisfy the first stage of the initial photo nanoimprint apparatus relief grating waveguide, and small batch production.
4. Progress nanoimprinting:
Based nanoimprint acquisition and related equipment to build their own equipment surface treatment process, after several rounds exploration process, has to go through the entire independent nanoimprint process (before the outer portion of the surface required for processing to a device's site for processing, there is no guarantee on time), the current nano-imprinting work is divided into two, one for the current test imprint processing wafers; and second, new glue, imprint glue and glue templates including test work, forming a stable glue and glue supply chain process library. FIG two following nanoimprint is a SEM FIG.
5. Since the software development tools:
AR is ARDesign Jing Long waveguide sheet Development Kit, binding ZEMAX Optic Studio software, fast automatic modeling, analysis evaluation of the waveguide lens imaging quality.
A schematic view of the operating area ARDesign
Modeling example in FIG.
Editor: lq, Read, original title: Long Jing photoelectric released diffraction optical waveguide module, based on independent innovation of micro-grating structure
Article Source: [Micro Signal: Memsensor, WeChat public number: Wright Pott Litepoint] Welcome to add attention! Please indicate the source of the article.
Our other product:
